Coating and thin film
Laurell WS-650Mz-23NPPB Programmable Spin Coater
Solution-based deposition of uniform polymer, sol-gel and nanomaterial thin films on flat substrates with controlled thickness by spin coating.
In short
Solution-based deposition of uniform polymer, sol-gel and nanomaterial thin films on flat substrates with controlled thickness by spin coating. The Laurell WS-650Mz-23NPPB is a laboratory-grade spin coater that holds wafers and square substrates up to 150 mm on a vacuum chuck and spins them through multi-step, programmable speed and acceleration profiles.
- Substrate size
- Wafers up to 150 mm; pieces and square substrates
- Maximum speed
- 12,000 rpm
- Speed resolution
- 1 rpm
Services on this instrument
Thin Film Deposition: CVD, Spray Pyrolysis and Spin Coating
from €7107–15 business daysRequest this serviceService detailsInstrument Operator Training
from €42014–30 business daysRequest this serviceService details
Overview
The Laurell WS-650Mz-23NPPB is a laboratory-grade spin coater that holds wafers and square substrates up to 150 mm on a vacuum chuck and spins them through multi-step, programmable speed and acceleration profiles. Using the balance between solvent evaporation and centrifugal force, it deposits photoresists, polymer solutions, sol-gel precursors, perovskite and quantum-dot inks, graphene oxide and nanoparticle dispersions as films of repeatable thickness from tens of nanometres to the micrometre range. A nitrogen purge inlet provides a controlled atmosphere for oxygen- and moisture-sensitive formulations, while the chemically resistant bowl and easy-clean design reduce cross-contamination. The system serves sample preparation in organic electronics, photovoltaics, sensors, membranes and functional coatings research, complementing other thin-film routes such as CVD and spray pyrolysis.
Measurement principle
Capabilities
Spin coating of wafers and square substrates up to 150 mm
Programmable multi-step speed and acceleration profiles up to 12,000 rpm
Repeatable film thickness from tens of nanometres to the micrometre range
Nitrogen purge for coating oxygen- and moisture-sensitive solutions
Photoresists, polymers, sol-gels, perovskites and nanoparticle dispersions
Static and dynamic dispense protocols with stored recipes
Suitable samples
Silicon and glass wafers
ITO/FTO-coated conductive glass
Polymer and photoresist solutions
Sol-gel and metal oxide precursors
Perovskite, quantum-dot and nanoparticle inks
Flexible polymer foils
Technical specifications
| Substrate size | Wafers up to 150 mm; pieces and square substrates |
|---|---|
| Maximum speed | 12,000 rpm |
| Speed resolution | 1 rpm |
| Programming | Multi-step recipes with independent speed, acceleration and time |
| Atmosphere | Nitrogen purge inlet |
| Substrate holding | Vacuum chuck with interchangeable chuck options |
Services on this instrument
Thin Film Deposition: CVD, Spray Pyrolysis and Spin Coating
from €7107–15 business daysRequest this serviceService detailsInstrument Operator Training
from €42014–30 business daysRequest this serviceService details
- Manufacturer
- Laurell
- Model
- WS-650Mz-23NPPB
- Catalogue no.
- 30
Quick answers
Spin Coater: key facts
What is Laurell WS-650Mz-23NPPB Programmable Spin Coater used for?
It is used for: Spin coating of wafers and square substrates up to 150 mm, Programmable multi-step speed and acceleration profiles up to 12,000 rpm, Repeatable film thickness from tens of nanometres to the micrometre range, Nitrogen purge for coating oxygen- and moisture-sensitive solutions, Photoresists, polymers, sol-gels, perovskites and nanoparticle dispersions, and Static and dynamic dispense protocols with stored recipes.
Which samples can Laurell WS-650Mz-23NPPB Programmable Spin Coater analyse?
Suitable samples: Silicon and glass wafers, ITO/FTO-coated conductive glass, Polymer and photoresist solutions, Sol-gel and metal oxide precursors, Perovskite, quantum-dot and nanoparticle inks, and Flexible polymer foils.
Which NAKTEM services use Laurell WS-650Mz-23NPPB Programmable Spin Coater?
Thin Film Deposition: CVD, Spray Pyrolysis and Spin Coating and Instrument Operator Training.
What results do I receive?
Typical deliverables: Thin film samples deposited on the agreed substrates (labelled, protective packaging), Process record covering precursor/gas composition, temperature, pressure, flow rate, spin speed and duration, Coated area map and visual uniformity assessment, Sheet resistance, thickness, XRD/Raman phase verification or SEM imaging on request, and Process summary report (PDF).
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Training
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Hands-on operator training on analytical instruments including SEM/EDS, XRD, Raman and rheometry, covering sample preparation, measurement and data interpretation.
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