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Electrochemistry and electrical

Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System

Contact-resistance-independent measurement of sheet resistance, resistivity and conductivity of thin films, coatings and semiconductor wafers.

Operational
SEMI MF84
SEMI MF390

In short

Contact-resistance-independent measurement of sheet resistance, resistivity and conductivity of thin films, coatings and semiconductor wafers. The Ossila P2010A2 is a benchtop four-point probe system that determines sheet resistance independently of contact and lead resistance by passing current through the outer pair of four equally spaced spring-loaded tips and measuring the voltage across the inner pair.

Measurement method
In-line four-point probe (DC)
Probe spacing
1.27 mm
Probe tips
Four spring-loaded rounded tips

Services on this instrument

Prices are a guide and may change with any additional requests. Our team will contact you to confirm the scope and the final price.

Overview

The Ossila P2010A2 is a benchtop four-point probe system that determines sheet resistance independently of contact and lead resistance by passing current through the outer pair of four equally spaced spring-loaded tips and measuring the voltage across the inner pair. When film thickness is entered, resistivity and conductivity are calculated automatically; the software applies geometric correction factors and reduces uncertainty through current sweeps and multi-measurement averaging. Typical specimens include conductive polymers, transparent conductive oxides (ITO, FTO), metal coatings, graphene and carbon nanotube films, doped semiconductor wafers and printed electronic layers. The system supports thin-film deposition process optimisation, verification of coating uniformity and electrical quality control in organic electronics, photovoltaics and sensor research.

Measurement principle

Capabilities

  • Sheet resistance (Ω/sq) measurement independent of contact resistance

  • Resistivity (Ω·cm) and conductivity (S/cm) calculation from film thickness

  • Current sweeps and multi-measurement averaging to reduce uncertainty

  • Geometric correction factors for accurate results on small and thin specimens

  • Multi-point mapping for coating uniformity assessment

  • Characterisation of transparent conductive oxide and conductive polymer films

Suitable samples

  • Transparent conductive oxide coatings (ITO, FTO)

  • Metal thin films and sputtered coatings

  • Conductive polymer and carbon-based films

  • Doped semiconductor wafers

  • Printed electronics and conductive ink layers

Technical specifications

Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System — Technical specifications
Measurement methodIn-line four-point probe (DC)
Probe spacing1.27 mm
Probe tipsFour spring-loaded rounded tips
Sheet resistance rangeFrom the mΩ/sq to the MΩ/sq range
Derived quantitiesResistivity, conductivity (with thickness input)
Control and dataPC software with automatic correction factors and CSV export

Services on this instrument

Prices are a guide and may change with any additional requests. Our team will contact you to confirm the scope and the final price.
Manufacturer
Ossila
Model
P2010A2
Catalogue no.
25
Reference standards
SEMI MF84, SEMI MF390

Quick answers

Four-Point Probe: key facts

What is Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System used for?

It is used for: Sheet resistance (Ω/sq) measurement independent of contact resistance, Resistivity (Ω·cm) and conductivity (S/cm) calculation from film thickness, Current sweeps and multi-measurement averaging to reduce uncertainty, Geometric correction factors for accurate results on small and thin specimens, Multi-point mapping for coating uniformity assessment, and Characterisation of transparent conductive oxide and conductive polymer films.

Which samples can Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System analyse?

Suitable samples: Transparent conductive oxide coatings (ITO, FTO), Metal thin films and sputtered coatings, Conductive polymer and carbon-based films, Doped semiconductor wafers, and Printed electronics and conductive ink layers.

Which standards does Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System relate to?

Relevant standards: SEMI MF84 and SEMI MF390.

Which NAKTEM services use Ossila P2010A2 Four-Point Probe Sheet Resistance Measurement System?

Electrical Sheet Resistance Testing and Instrument Operator Training.

What results do I receive?

Typical deliverables: Sheet resistance (Ω/sq) per measurement point with the geometric correction factors applied, Resistivity (Ω·cm) and conductivity (S/cm) for films with supplied thickness, Multi-point uniformity map and statistical summary on request, Method summary covering current, probe spacing, measurement temperature and sample geometry, and Raw data (CSV) and PDF report.

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