Chemical Vapour Deposition (CVD) Thin Film and Nanomaterial Synthesis System

The system is a thermal chemical vapour deposition (CVD) platform comprising a quartz reaction tube, a process gas line fed through mass flow controllers (MFC), a vacuum pump and pressure control. Gaseous or vaporised precursors decompose or react at the substrate surface within a controlled temperature zone to form thin films or nanostructures. Typical processes include graphene growth on copper or nickel foil under argon, hydrogen and hydrocarbon flow, carbon nanotube synthesis on catalyst-coated substrates, monolayer growth of transition metal dichalcogenides such as MoS₂ and WS₂, metal oxide and nitride coatings, and atmosphere-controlled annealing. Multi-segment temperature programming, operation from atmospheric to low pressure and programmable gas mixtures allow repeatable growth recipes. The materials produced are characterised in the same centre by Raman, SEM/EDS, XRD and four-point probe measurements.