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Microscopy and imaging

ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector

Nanometre-scale surface morphology imaging with simultaneous elemental mapping by energy-dispersive X-ray spectroscopy.

Operational
ISO 16700
ASTM E1508
ISO 22309

In short

Nanometre-scale surface morphology imaging with simultaneous elemental mapping by energy-dispersive X-ray spectroscopy. The ZEISS EVO 10 is a versatile tungsten-filament scanning electron microscope operating in both high-vacuum and variable-pressure modes. Non-conductive polymers, ceramics and biological specimens can be examined in variable-pressure mode without conductive coating.

Electron source
Tungsten filament
Accelerating voltage
0.2 – 30 kV
Resolution
3 nm @ 30 kV (SE)

Services on this instrument

Prices are a guide and may change with any additional requests. Our team will contact you to confirm the scope and the final price.

Overview

The ZEISS EVO 10 is a versatile tungsten-filament scanning electron microscope operating in both high-vacuum and variable-pressure modes. Non-conductive polymers, ceramics and biological specimens can be examined in variable-pressure mode without conductive coating. The integrated Oxford Instruments EDS detector complements imaging data with chemical composition through point analysis, line scans and elemental mapping. The system is configured to deliver repeatable, traceable results for quality control, failure analysis and R&D programmes.

Measurement principle

Capabilities

  • Secondary-electron (SE) and backscattered-electron (BSE) imaging

  • Variable-pressure mode for uncoated non-conductive specimens

  • EDS point, line and mapping analysis (elements B to U)

  • Particle size, porosity and layer thickness measurements

  • Fracture surface and failure analysis reporting

Suitable samples

  • Metals and alloys

  • Ceramics and composites

  • Polymers and coatings

  • Powders and nanomaterials

  • Biological and dried specimens

Technical specifications

ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector — Technical specifications
Electron sourceTungsten filament
Accelerating voltage0.2 – 30 kV
Resolution3 nm @ 30 kV (SE)
Magnification5× – 1,000,000×
Vacuum modesHigh vacuum / variable pressure (10–400 Pa)
EDS detectorOxford Instruments SDD

Services on this instrument

Prices are a guide and may change with any additional requests. Our team will contact you to confirm the scope and the final price.
Manufacturer
ZEISS
Model
EVO 10 + Oxford Instruments EDS
Catalogue no.
19
Reference standards
ISO 16700, ASTM E1508, ISO 22309

Quick answers

SEM / EDS: key facts

What is ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector used for?

It is used for: Secondary-electron (SE) and backscattered-electron (BSE) imaging, Variable-pressure mode for uncoated non-conductive specimens, EDS point, line and mapping analysis (elements B to U), Particle size, porosity and layer thickness measurements, and Fracture surface and failure analysis reporting.

Which samples can ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector analyse?

Suitable samples: Metals and alloys, Ceramics and composites, Polymers and coatings, Powders and nanomaterials, and Biological and dried specimens.

Which standards does ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector relate to?

Relevant standards: ISO 16700, ASTM E1508, and ISO 22309.

Which NAKTEM services use ZEISS EVO 10 Scanning Electron Microscope with Oxford EDS Detector?

SEM/EDS Imaging and Microanalysis, Failure Analysis and Materials Consulting, and Instrument Operator Training.

What results do I receive?

Typical deliverables: SE/BSE micrographs with scale bars and acquisition parameters (TIFF/PNG), EDS spectra and point/area analysis tables (weight % and atomic %), Elemental maps and line-scan profiles, Technical report (PDF) covering sample preparation, coating and measurement conditions, and Particle size, thickness or porosity measurement tables on request.

  • Training

    Why Materials Characterization Training Pays Off

    A badly prepared sample, a wrongly chosen parameter or an over-interpreted spectrum can cost far more than the instrument itself. We explain why structured characterization training delivers a tangible return for R&D and quality teams.

    October 27, 20264 min read
  • Characterization

    SEM/EDS Sample Preparation Guide

    Reliable scanning electron microscopy and EDS results begin long before the sample enters the chamber. A hands-on guide to mounting, conductive coating, surface preparation and the mistakes that most often ruin an analysis.

    September 22, 20265 min read
  • Characterization

    How to Choose a Particle Size Analysis Method

    A practical guide to choosing between laser diffraction, electron microscopy, dynamic light scattering and sieving, based on your sample, your size range and how the result will be used.

    September 8, 20265 min read

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